PlasmaProTM System133 - 300mm Plasma Etch & Deposition Tool (R&D)

PlasmaPro System133 R&D tool

Research & Development tool for up to 300mm wafers

The PlasmaPro System133 process tool offers 300 mm large batch etch and deposition capability, with flexible configurations allowing ICP, RIE, PECVD and ICP-CVD (HD-PECVD) processes on a wide range of materials and device applications.

Images
Process Techniques
Key Features
Processes
Support

Plasmalab System133 PECVD open - Click for larger image

Plasmalab System133 PECVD open detail - Click for larger image

Plasmalab System133 ICP open - Click for larger image

Plasmalab System133 ICP open detail - Click for larger image

PlasmaPro System133 Process Techniques

Inductively Coupled Plasma (ICP)
Inductively Coupled Plasma Chemical Vapour Deposition (ICP CVD)
Plasma Enhanced Chemical vapour deposition (PECVD)
Reactive Ion Etch (RIE)

We work closely with our customers to develop new and customised processes according to their application needs; please contact us for details.

Product Features

300 mm single wafer capability Industry-leading batch wafer processing of:
20 x 2" , 8 x 3" , 4 x 4"
Options of single wafer/batch or cassette loading via the load-locked wafer entry: the PlasmaPro System133 can be integrated into a cluster system with central robotic wafer handler and full cassette-to-cassette wafer handling for production processes
Substrate temperature control is provided by a range of electrodes, with a temperature range of -150 °C to +700 °C
Endpoint detection by laser interferometry and/or optical emission spectroscopy can be fitted to the PlasmaPro System133 to enhance etch control
Options of a 4-, 8- or 12-line gas pod provide flexibility in processes and process gases, and may be remotely sited in the service area, away from the main process tool

Processes

HBLEDs: industry-leading batch production performance for: GaN, AlGaN and related materials; sapphire and SiC substrate etch
300 mm SiO2, SiNx deposition
Diamond-like carbon (DLC) deposition and etch

- A Global Reach

Oxford Instruments is committed to supporting our customers’ success. We recognise that this requires world class products complemented by world class support. Our global service force is backed by regional offices, offering rapid support wherever you are in the world.

Service Centres*

Parts Centres

Europe & Middle East

Montevrain, France
Wiesbaden, Germany
Haifa, Israel
St Petersburg, Russia
Moscow, Russia
Bristol, UK

USA

Arizona, USA
Texas, USA
San Francisco, CA, USA
Concord, MA, USA

Asia

Beijing, China
Guangzhou, China
Shanghai, China
Hong Kong
New Delhi, India
Mumbai, India
Calcutta, India
Bangalore, India
Tokyo, Japan
Kyungki-do, Korea
Penang, Malaysia
Singapore
Taiwan County, Taiwan

Asia

Shanghai, China
Taiwan County, Taiwan

EMEA

Bristol, UK

USA

Concord, MA, USA

*Includes agents with OIPT trained engineers

For information on our Flexible Support Agreements please visit our Support pages

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