OpAL® – Open Load ALD Tool - Open Load Atomic Layer Deposition Tool

OpAL
OpAL ALD Tool

A compact open-load system for Atomic Layer Deposition (ALD)

OpAL introduces to the market a unique thermal ALD tool with a clear and easy upgrade route to plasma, allowing the combination of both plasma and thermal ALD in a single compact tool. 

  • Open loaded thermal ALD tool with plasma option
  • Field upgrade available for plasma option
  • Small wafer pieces up to full 200mm wafers – equally
    suitable for academic and industry R&DThermal and/or plasma chemistries available for:
    • Oxides: HfO2, Al2O3, TiO2, SiO2, ZnO, Ta2O5
    • Nitrides: TiN, Si3N4
    • Metals: Ru, Pt

 

OpAL ALD System Benefits:

  • Vapour draw or bubbling of up to four liquid or solid precursors
  • Can be fitted with a nitrogen purged glove box with sample entry load lock for dry environment
  • Easily detachable liners reduce chamber cleaning times
  • In-situ analytical options including spectroscopic ellipsometry linked into ALD control software

 

Power ahead with intuitive software

  • Utilising the same software platform as Oxford Instruments’ trusted PlasmaPro product family, the OpAL recipe-driven, multi-user level, PC2000TM control software is easy-to-use and tailored for rapid cycle ALD.

 

  • Images 
  • Applications 
  • Process Guarantees 
  • Features 
  • Support 

 OpAL Closed - Click for larger image  OpAL Wafer - click for larger image OpAL Open - Click for larger image 

Example ALD applications:

  • Nano-electronics
  • High-k gate oxides1
  • Storage capacitor dielectrics2 High aspect ratio diffusion barriers for Cu interconnects
  • Pinhole-free passivation layers for OLEDs and polymers3
  • Passivation of crystal silicon solar cells4
  • Highly conformal coatings for microfluidic and MEMS applications
  • Coating of nanoporous structures
  • Bio MEMS
  • Fuel cells

Oxford Instruments’ customers benefit from our process guarantees: controllable, repeatable processes developed in our own applications laboratory and backed by onsite process acceptance and support.

  • Up to 200 mm wafer with typical uniformity <±2%
  • Provides excellent step coverage even inside high aspect ratio structures
  • Offers superb thin film barrier properties
  • Low carbon contamination of Al2O3 (AES)
  • Amorphous, pin-hole free Al2O3 (TEM)
  • Excellent uniformity of HfO2, < ±2% on a 200 mm wafer (Spectroscopic Ellipsometry)

OpAL and FlexAL System Features:

    Feature  OpAL  FlexAL
    Substrates Up to 200mm wafers & pieces directly on stage Up to 200mm wafers handling and pieces on a carrier plate
    Bubbled liquid & solid precursors Up to 3 Up to 4
    Max precursor source temperature 200ºC (Jacket) 200ºC (Oven & jacket)
    Wafer delivery (inc source pot) Included Included
    Mfc controlled gas lines with rapid delivery system;
    1) thermal gas precursors (e.g. NH3, O2)
    2) plasma gases (e.g. O2, N2, H2)
    2 internally.
    Up to 8 in externally
    mounted gas pod
    Up to 10 in externally mounted gas pod
    Plasma Option/field upgrade Option
    Loading Open load Loadlock or cassette
    Clusterable to other process modules No Yes - inc third party MESC modules as special option
    Wafer stage temperature range

    25ºC – 400ºC

    25ºC – 400ºC (550ºC option)

    Ellipsometry ports Yes Yes
    Swagelok 10ms rapid pulsing ALD valves Yes Yes

Safety Features:

      •  Cabinet can be fitted to extraction lines and has nitrogen purge for assured health and safety compliance
      •  Pneumatic hoist for safe opening of chamber
      •  Can be fitted with extraction hood or nitrogen purged glove box for health and safety compliance
 - A Global Reach

Oxford Instruments is committed to supporting our customers’ success. We recognise that this requires world class products complemented by world class support. Our global service force is backed by regional offices, offering rapid support wherever you are in the world.

 

 Service Centres*   Parts Centres

Europe & Middle East

Montevrain, France
Wiesbaden, Germany
Haifa, Israel
St Petersburg, Russia
Moscow, Russia
Bristol, UK

USA

Arizona, USA
Texas, USA
San Francisco, CA, USA
Concord, MA, USA

Asia

Beijing, China
Guangzhou, China
Shanghai, China
Hong Kong
New Delhi, India
Mumbai, India
Calcutta, India
Bangalore, India
Tokyo, Japan
Kyungki-do, Korea
Penang, Malaysia
Singapore
Taiwan County, Taiwan

Asia

Shanghai, China
Taiwan County, Taiwan

EMEA

Bristol, UK

USA

Concord, MA, USA

*Includes agents with OIPT trained engineers

For information on our Flexible Support Agreements please visit our Support pages

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