AlN Epitaxial Growth - Aluminium Nitride Layers for III-V Nitride Epitaxy 

Aluminium Nitride Layers for III-V Nitride Epitaxy  and  High Frequency Applications

Available AlN templates on SiC:

 Substrate  4H-SiC or 6H-SiC
 Substrate Orientation  On axis (0001) Si face - electrically conducting
Substrate Diameter 2", 3" and 4"
AlN Thickness Range 0.2 to 20µm

Typical template properties for 10-µm thick AlN layer on 2-inch SiC substrate:

 Properties Specification
 AlN Thickness  10µm
Thickness variation <4% std. deviation
Thickness uniformity <2% std deviation
Dislocation Density (cm-2) 5 to 9 x 108
FWHM of X-ray w-scan (00.2), arcsec <450
Surface Morphology As grown or polished (typical av. RMS <0.5nm)
Doping Undoped
Electrical Resistivity (W-cm) >1010 (@300k) and >107 (@500k)

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AlN on 4 inch SiC - click for larger image

 Electrical Resistivity - click for larger image

AlN (20 µm) on 4-inch SiC

 Electrical Resistivity of AlN Layer

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