PDMS Etching - Polydimethylsiloxane Etch

PDMS Etch - Click for larger image
PDMS etch Depth 90µm and
profile 92°(Contamination due
to breaking the sample for analysis)
Related Products:

System 80Plus          System100

 

Inductively coupled plasma sources

  • ICP 65 for up to 2” wafers
  • ICP 180 for up to 100mm wafers
  • ICP 380 for up to 200mm wafers
  • Smaller wafer pieces may also be etched in each system
  • ICP etching with RIE-biased and temperature-controlled wafer electrode
  • Fluorinated gas based process

 

Results

Depth: 90µm

Etch rate:  1.2µm/min

Selectivity Cu mask: >50:1

Uniformity: ±3.5% across 200mm wafer

Profile: 89-95° controllable

 

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Related Products

Related Information

Etch Processes - Etching Processes
GaAs/AlGaAs Etching - Gallium Arsenide/Aluminium Gallium Arsenide Etch
InSb Etching - Indium Antimonide Etch
InGaAlP Etching - Aluminium gallium indium phosphide Etch
GaSb Etching - Gallium Antimonide Etch
Deep GaP Etching - Gallium Phosphide Etch
InP Etching - Indium Phosphide Etch
ZnSe Etching Zinc Selenide Etch
InAlAs Etching - Indium Aluminium Arsenide Etch
InP/ InGaAsP Etching - Indium Phosphide/ Indium Gallium Arsenide Etch
GaN Etching, Gallium Nitride Etch, Gallium Nitride Etching
Aluminium Etch, Al Etching
Au Etching - Gold Etch
Cr Etching - Chromium Etch
Cu Etching - Copper Etch
Pr Etching - Photoresist Etch
Silyated Photoresist Etching - Silyated Photoresist Etch
Polyimide Etching - Polyimide Etch
PMMA Etching - Polymethyl Methacrylate Etch
Diamond Etching - Diamond Etch
BCB ICP Etching - Benzocyclobutene Etch
LiNbO3 Etching - Lithium Niobate Etch
LiTaO3 Etching - Lithium Tantalum Oxide Etch
SiC Etching - Silicon Carbide Etch
PZT Etching - Lead Zirconium Titanate Etch
ITO Reactive Ion Etching - Indium Tin Oxide Etch
Al2O3 Etching - Aluminium Oxide Etch - Sapphire ICP Etching
PbSe Etching - Lead Selenide Etch
Bi2Te3 Etching - Bismuth Telluride Etch
Ta2O5 Etching - Tantalum Pentoxide Etch
GST Etching - Germanium Antimony Telluride Etching
Mo Etch - Molybdenum Etch
Nb Etching - Niobium Etch
Ni Etching - Nickel Etch
NiCr Etching - Nichrome Etch
Pt Etching - Platinum Etch
Ta Etching - Tantalum Etch
Ti Etching - Very Deep Titanium Etch
TiN Etching - Titanium Nitride Etch
W Etching - Tungsten Etch
WSi Etching - Tungsten Silicide Etch
Si Bosch Etching - Silicon Bosch Etch
Si Cryogenic Etching - Silicon Cryogenic Etch
Si Mixed Etching - Silicon (C4F8 - SF6) Etch
Si (HBr) Etching - Silicon Hydrogen Bromide Etch
Si (isotropic) Etching - Isotropic Silicon Etch
SiGe Etching - Silicon Germanium Etch
SOI Bosch Etching - Silicon-on-Insulator Bosch Etch

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