TiO2 Deposition - Titanium Dioxide Deposition - Ion Beam Deposition  

Ion Beam Deposition from a Ti metal
target with O2 assist

Related Product:  Optofab 3000

Low power process:

Deposition rate: > 8 nm/min
Uniformity: <± 0.5 % over 75 mm thick annulus
<± 3 % over 8” substrate

High power process:

Deposition rate: > 12 nm/min
Refractive index 2.468 (632nm)
Uniformity: <± 0.5 % over 75 mm thick annulus
<± 3 % over 8” substrate