Deposition Processes

Deposition processes from OIPT

Oxford Instruments Plasma Technology’s experience in supplying deposition process solutions to both the production and research & development markets worldwide has given us one of the strongest libraries of deposition processes and capabilities in the world, with unequalled breadth of experience in deposition process development and support by our Applications Engineers.
 
Below is a sample of some of the deposition processes Oxford Instruments Plasma Technology can provide -please contact us to discuss your specific needs, and our expert sales and applications staff will be pleased to help you select the right deposition process and tools to meet your requirements.

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Related Information

SiO2 Deposition - Silicon Dioxide Deposition
SiN Deposition - Silicon Nitride Deposition
Hfn Deposition - Hafnium Deposition
High Quality Optical Coatings
Indium Tin Oxide Magnetron Sputtering Deposition
Al2O3 - Aluminium Oxide Deposition
Ion Beam Deposition of VaO(5-x) - Vanadium Pentoxide Deposition
TiO2 Deposition - Titanium Dioxide Deposition
ZnO ALD - Zinc Oxide Atomic Layer Deposition
Hafnium dioxide Reactive Ion Beam Deposition (HfO2 RIBD)
La2O3 Deposition - Lanthanum(III) Oxide Deposition
Ru Deposition - Ruthenium Deposition
a-Si Deposition - Amorphous Silicon Deposition (PECVD)
DLC Deposition - Diamond like Carbon Deposition
SiC Deposition - Silicon Carbide Plasma Enhanced Chemical Vapour Deposition
SiGe Deposition - Silicon Germanium Deposition
PolySi Deposition - Polysilicon Deposition

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