Al Sputter Deposition - Aluminium Sputter Deposition 

Al Sputter Deposition

Al deposited on 1:1 and 2:1 aspect
ratio Si lines. Continuous metal film
on the walls.

Al Sputter Deposition
Aluminium Sputtering with excellent step coverage

Process Benefits

  • Wide temperature range
  • Low resistivity
  • High reflectivity
  • Low surface roughness

Applications:

 

  • Metal Interconnects
  • Hardmask

Technology:

  • Magnetron Sputtering rotating table

 

  • Results 
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Results:

Rate:  50 nm/ min at 5 kW
Uniformity  +/- 5 % (6” wafer)
Excellent step coverage  
Smooth surface

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Related Products

Related Information

Deposition Processes - Deposition Process
SiO2 Deposition - Silicon Dioxide Deposition
SiN Deposition - Silicon Nitride Deposition
Hfn Deposition - Hafnium Deposition
High Quality Optical Coatings
Indium Tin Oxide Magnetron Sputtering Deposition
Al2O3 - Aluminium Oxide Deposition
Ion Beam Deposition of VaO(5-x) - Vanadium Pentoxide Deposition
TiO2 Deposition - Titanium Dioxide Deposition
ZnO ALD - Zinc Oxide Atomic Layer Deposition
Hafnium dioxide Reactive Ion Beam Deposition (HfO2 RIBD)
La2O3 Deposition - Lanthanum(III) Oxide Deposition
Ru Deposition - Ruthenium Deposition
a-Si Deposition - Amorphous Silicon Deposition (PECVD)
DLC Deposition - Diamond like Carbon Deposition
SiC Deposition - Silicon Carbide Plasma Enhanced Chemical Vapour Deposition
SiGe Deposition - Silicon Germanium Deposition
PolySi Deposition - Polysilicon Deposition

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