Ion Beam Deposition

Ion Beam Deposition
Ion Beam Deposition

Ion Beam Deposition from Oxford Instruments

Process types:

  • IBD - Ion Beam Deposition
  • RIBD - Reactive Ion Beam Deposition
     

Hardware:

  • Rotating and tiltable substrate holder (Ionfab 300 plus (SM) and (LC) only)
  • Deposition Ion Source: 15 cm, 13.56 MHz driven
  • PBN beam neutralisation
  • Gas inlet through source, assist source and into the chamber
  • Independently changeable parameters: gas flows, ion energy, ion current, accelerator voltage, beam neutralisation
  • Mutiple targets with fixed shields and rotating shutters
  • Second source as assist source to control stochiometry (e.g. depositing oxide from metal target) or as pre-cleaning on (Ionfab 300 plus (SC) and (LC) only)

 

  • Key Applications 
  • Benefits 
  • Ion Beam Deposition Systems 
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Key Applications for Ion Beam Deposition

  • Ring laser gyroscope mirrors
  • High power laser optics
  • Gravity wave detector mirrors
  • Astronomical instrumentation
  • Anti reflecting and high reflecting coating (e.g. laser bars)

Benefits of Ion Beam Deposition

  • High surface quality
  • Dense smooth films
  • Very low scattering
  • Very low optical losses
  • Very good run to run repeatability

 

  • Excellent uniformity
  • Maximum flexibility
  • Range of applications
  • Process repeatability
  • Low cost of ownership

 Ion Beam Deposition Systems from Oxford Instruments

Feature:

Ionfab 300Plus (SC) and (LC)

Ionfab 500Plus  

Target size 8 inch target 14 inch target
Number of target  Up to 4 targets Up to three targets
Platen size  Up to 8 inch wafer Rotating planetary (4 x 10")
End point detection  Dual Xtal monitors Dual Xtal monitors
Platen rotation Up to 20rpm (high speed option) Up to 20rpm
Platen tilt angle -90ºC to +75ºC NA
Platen temperature 10ºC to 300ºC NA
Ion source 15cm RF ion source 15cm RF ion source
Assist or Pre-clean source  15 or 35cm RF ion source NA
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